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diff --git a/test/10.1038_s41467-022-34369-4-citation.ris b/test/10.1038_s41467-022-34369-4-citation.ris new file mode 100644 index 0000000..37ef355 --- /dev/null +++ b/test/10.1038_s41467-022-34369-4-citation.ris @@ -0,0 +1,33 @@ +TY - JOUR +AU - Prudkovskiy, Vladimir S. +AU - Hu, Yiran +AU - Zhang, Kaimin +AU - Hu, Yue +AU - Ji, Peixuan +AU - Nunn, Grant +AU - Zhao, Jian +AU - Shi, Chenqian +AU - Tejeda, Antonio +AU - Wander, David +AU - De Cecco, Alessandro +AU - Winkelmann, Clemens B. +AU - Jiang, Yuxuan +AU - Zhao, Tianhao +AU - Wakabayashi, Katsunori +AU - Jiang, Zhigang +AU - Ma, Lei +AU - Berger, Claire +AU - de Heer, Walt A. +PY - 2022 +DA - 2022/12/19 +TI - An epitaxial graphene platform for zero-energy edge state nanoelectronics +JO - Nature Communications +SP - 7814 +VL - 13 +IS - 1 +AB - Graphene’s original promise to succeed silicon faltered due to pervasive edge disorder in lithographically patterned deposited graphene and the lack of a new electronics paradigm. Here we demonstrate that the annealed edges in conventionally patterned graphene epitaxially grown on a silicon carbide substrate (epigraphene) are stabilized by the substrate and support a protected edge state. The edge state has a mean free path that is greater than 50 microns, 5000 times greater than the bulk states and involves a theoretically unexpected Majorana-like zero-energy non-degenerate quasiparticle that does not produce a Hall voltage. In seamless integrated structures, the edge state forms a zero-energy one-dimensional ballistic network with essentially dissipationless nodes at ribbon–ribbon junctions. Seamless device structures offer a variety of switching possibilities including quantum coherent devices at low temperatures. This makes epigraphene a technologically viable graphene nanoelectronics platform that has the potential to succeed silicon nanoelectronics. +SN - 2041-1723 +UR - https://doi.org/10.1038/s41467-022-34369-4 +DO - 10.1038/s41467-022-34369-4 +ID - Prudkovskiy2022 +ER - |
